High-frequency acoustic innovation meets German engineering precision. Uniform, damage-free wafer cleaning for the world's most demanding semiconductor applications.
Engineered to deliver consistent megasonic energy from wafer center to edge — ensuring reliable, repeatable results across every run, every substrate.
Advanced frequency control protects even the most delicate structures. Sub-micron particles removed without mechanical damage to features or films.
Service-first design means components are easy to access, replace, and upgrade — minimising downtime and protecting your production schedule.
Every SONIQ unit is assembled and tested in Stockach, Germany — giving you traceable quality control and the reliability of German engineering standards.
SONIQ uses controlled high-frequency acoustic energy transmitted through a liquid medium to remove particle contamination — without chemicals, without abrasion.
A piezoelectric transducer generates high-frequency sound waves at 1, 2, and 3 MHz, transmitted uniformly through the process liquid.
Controlled acoustic streaming and micro-cavitation dislodge sub-micron particles from the wafer surface — gently and uniformly across the entire substrate.
Dislodged particles are carried away by the flowing liquid, preventing re-deposition and ensuring consistently high particle removal efficiency.
Front-end wafer cleaning, post-CMP, photoresist removal. Compatible with leading process chemistries.
Gentle removal of particles from micro-electromechanical structures without disturbing fragile features.
Contamination-free cleaning of optical substrates, lenses, and coated surfaces to sub-micron cleanliness.
| Operating frequencies | 1, 2 & 3 MHz |
| Particle removal efficiency | >99% (≥50nm particles) |
| Substrate compatibility | Si, SiO₂, III-V, Glass, Sapphire |
| Chemical compatibility | SC1, SC2, DHF, DIW, IPA |
| Operation | Continuous 24/7 |
| Design | Modular — scalable configurations |
| Origin | Designed & assembled in Germany |
| Certification | CE marked |
Contact our team to arrange a demonstration or discuss your specific cleaning process requirements.
Request a demo