Flagship product · Made in Germany

SONIQMegasonic Cleaning System

High-frequency acoustic innovation meets German engineering precision. Uniform, damage-free wafer cleaning for the world's most demanding semiconductor applications.

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99%+

Particle removal efficiency

↓ Cycle

Reduced process time

24/7

Continuous operation

Made DE

Assembled in Stockach

The SONIQ advantage

Why choose SONIQ?

Uniform acoustic coverage

Engineered to deliver consistent megasonic energy from wafer center to edge — ensuring reliable, repeatable results across every run, every substrate.

Structure integrity preserved

Advanced frequency control protects even the most delicate structures. Sub-micron particles removed without mechanical damage to features or films.

Modular & maintainable

Service-first design means components are easy to access, replace, and upgrade — minimising downtime and protecting your production schedule.

German-assembled quality

Every SONIQ unit is assembled and tested in Stockach, Germany — giving you traceable quality control and the reliability of German engineering standards.

Technology

How megasonic cleaning works

SONIQ uses controlled high-frequency acoustic energy transmitted through a liquid medium to remove particle contamination — without chemicals, without abrasion.

01
Acoustic energy generation
A piezoelectric transducer generates high-frequency sound waves at 1, 2, and 3 MHz, transmitted uniformly through the process liquid.
02
Cavitation & streaming
Controlled acoustic streaming and micro-cavitation dislodge sub-micron particles from the wafer surface — gently and uniformly across the entire substrate.
03
Particle transport & removal
Dislodged particles are carried away by the flowing liquid, preventing re-deposition and ensuring consistently high particle removal efficiency.

Megasonic cavitation bubbles — SONIQ cleaning process

The other half of the system

Driven by the SONIQ RF generator

A megasonic system is only as good as the energy it puts into the liquid. The transducer converts that energy; the generator decides exactly how much, at which frequency, and how tightly it is held. Both halves of SONIQ are developed and built by DTEC, so they are tuned to each other rather than matched after the fact.

SONIQ GeneratorSets frequency, power and pulsing

TransducerConverts RF into acoustic energy

SubstrateUniform, damage-free cleaning

Forward-power regulation at 0.1 W resolution keeps acoustic dose repeatable run to run
Reflected power and RTD transducer temperature are monitored continuously, with their own warning and alarm limits
One ASCII command set over RS-232 and Ethernet — the same across every generator in the series
Quarter-width 2U cabinet at 3 kg, mountable inside the tool frame

Explore the RF generator series

SONIQ RF generator — quarter-width cabinet driving the megasonic transducer

SONIQ 100 Flex — 100 W, switchable 465 / 925 kHz, built in Stockach

Applications

Where SONIQ excels

Semiconductor

Front-end wafer cleaning, post-CMP, photoresist removal. Compatible with leading process chemistries.

MEMS

Gentle removal of particles from micro-electromechanical structures without disturbing fragile features.

Precision optics

Contamination-free cleaning of optical substrates, lenses, and coated surfaces to sub-micron cleanliness.

Technical specifications

System specifications

Operating frequencies	1, 2 & 3 MHz
Particle removal efficiency	>99% (≥50nm particles)
Substrate compatibility	Si, SiO₂, III-V, Glass, Sapphire
Chemical compatibility	SC1, SC2, DHF, DIW, IPA
Operation	Continuous 24/7
Design	Modular — scalable configurations
Origin	Designed & assembled in Germany
Certification	CE marked

Request full datasheet

Semiconductor wafer — SONIQ compatible substrates